Overcoming the compensation of acceptors in GaN:Mg by defect complex formation
Journal article
Xie, Z., Buckeridge, J., Catlow, R.C.A., Zhang, A., Keal, T.W., Sherwood, P., Lu, Y., Woodley, S.M. and Sokol, A.A. (2023). Overcoming the compensation of acceptors in GaN:Mg by defect complex formation. APL Materials. 11 (8), p. 080701. https://doi.org/10.1063/5.0148858
Authors | Xie, Z., Buckeridge, J., Catlow, R.C.A., Zhang, A., Keal, T.W., Sherwood, P., Lu, Y., Woodley, S.M. and Sokol, A.A. |
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Abstract | In GaN:Mg, the MgGa acceptor is compensated extensively by the formation of nitrogen vacancies (VN) and Mg interstitials (Mgi). However, we show that such compensation can be overcome by forming two kinds of Mg-rich complexes: one that contains VN and the other that contains only MgGa and Mgi. Such complexing not only neutralizes VN and Mgi but also forms better complex acceptors that have lower formation energies and smaller hole localization energies than isolated MgGa. Our results help explain the different doping behaviors in samples grown by different methods. |
Year | 2023 |
Journal | APL Materials |
Journal citation | 11 (8), p. 080701 |
Publisher | AIP Publishing |
ISSN | 2166-532X |
Digital Object Identifier (DOI) | https://doi.org/10.1063/5.0148858 |
Web address (URL) | https://doi.org/10.1063/5.0148858 |
Publication dates | |
Online | 04 Aug 2023 |
Publication process dates | |
Accepted | 12 Jul 2023 |
Deposited | 07 Aug 2023 |
Publisher's version | License File Access Level Open |
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https://openresearch.lsbu.ac.uk/item/94q68
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